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Title: 193nm Immersion Lithography: Status and Challenges
Url: https://spie.org/news/immersionlitho-intro?SSO=1
Creator: Back, David
Wei, Yayi
Publisher: Society of Photographic Instrumentation Engineers
Description: This article is a comprehensive review of 193nm immersion lithography. It focuses on the materials and processes rather than the optical system of the tool. The article covers the history and current status of the technology.
LC Classification: Bibliography. Library science. Information resources (General) -- Book industries and trade -- Printing -- Practical printing -- Other processes, A-Z -- Lithography
Science -- Physics -- Optics. Light
GEM Subject: Science -- Engineering
Science -- Technology
Science -- Physics
Key Concept: Physics
Physics -- Waves
Date Issued: 2007-03-22
Resource Type: Reference Material
Instructional Material
Format: Document -- HTML
Audience: Educator
Professional/Practitioner
Education Level: Higher Education
Higher Education -- Graduate/Professional
Higher Education -- Undergraduate (Lower Division)
Higher Education -- Undergraduate (Upper Division)
Higher Education -- Technical Education (Upper Division)
Higher Education -- Technical Education (Lower Division)
Vocational/Professional Development Education
Language: English
Rights: SPIE
Access Rights: Free access
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Source Type: ATE Center
Source: NetWorks
Full Record Views: 59
Resource URL Clicks: 16
Cumulative Rating: NOT YET RATED
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