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Title: The Road to Extreme-Ultraviolet Lithography
Url: http://spie.org/x8561.xml?ArticleID=x8561
Creator: La Fontaine, Bruno
Publisher: Society of Photo-optical Instrumentation Engineers
Description: Extreme ultraviolet lithography promises to be the key enabler for patterning semiconductor devices of the future, but a number of challenges remain.
LC Classification: Fine arts -- Print media -- Lithography -- Addresses, essays, lectures
Science -- Physics -- Optics. Light -- Spectroscopy -- Ultraviolet spectrum
Technology -- Mechanical engineering and machinery -- Control engineering systems. Automatic machinery -- Control systems -- Special, A-Z -- Semiconductors
GEM Subject: Science -- Engineering
Science -- Technology
Key Concept: Physics -- Lasers
Physics -- Semiconductors
Resource Type: Instructional Materials
Reading Materials
Science Materials
Format: html
Audience: College/University Instructors
Professional Formation
Secondary Education
Technical School First Cycle
Technical School Second Cycle
University First Cycle
University Second Cycle
Vocational Training
Language: English
Rights: SPIE
Access Rights: Free access
Date Of Record Release: 2011-02-17 03:00:03 (W3C-DTF)
Date Last Modified: 2011-08-26 11:16:01 (W3C-DTF)
Source Type: ATE Center
Source: NetWorks
Full Record Views: 93
Resource URL Clicks: 14
Cumulative Rating: NOT YET RATED
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