|Searched for: Source is NetWorks
|Results 1 - 5 of 1256
This article from SPIE describes how dielectric breakdown and wet etching may provide a method of fabricating 3D nano- and microscale channels inside transparent dielectric materials. The article includes several...
Extreme ultraviolet lithography promises to be the key enabler for patterning semiconductor devices of the future, but a number of challenges remain.
Working with a material 10 times lighter than steel -- but 250 times stronger -- would be a dream come true for any engineer. If this material also had amazing properties that made it highly conductive of heat and...
This article from SPIE discusses how harnessing quantum interference enables single aromatic annulene molecules to function as transistors. The article includes several illustrations which help to demonstrate the...
This article is a comprehensive review of 193nm immersion lithography. It focuses on the materials and processes rather than the optical system of the tool. The article covers the history and current status of the...
|Search time: 0.070 seconds
Manage your resources
Save, organize, and share resources that you find.
Subscribe to bulletins
Automatically be notified about new resources that match your interests.
It's easy, fast, and FREE!