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This article from SPIE describes how dielectric breakdown and wet etching may provide a method of fabricating 3D nano- and microscale channels inside transparent dielectric materials. The article includes several...
Extreme ultraviolet lithography promises to be the key enabler for patterning semiconductor devices of the future, but a number of challenges remain.
This article from SPIE discusses how harnessing quantum interference enables single aromatic annulene molecules to function as transistors. The article includes several illustrations which help to demonstrate the...
This article is a comprehensive review of 193nm immersion lithography. It focuses on the materials and processes rather than the optical system of the tool. The article covers the history and current status of the...
This is a web site for emerging electronic designs and innovations. The site features a number of articles on electronic design related topics. Multimedia resources, including videos, are included. Twitter, Facebook and...
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