You are not logged in.
AMSER logo

Search Results

View Resource Plasma Physics

This is a PDF version of lecture slides by Dr. Philip D. Rack (Assistant Professor, Department of Materials Science and Engineering at the University of Tennessee in Knoxville) that discuss information from the silicon's crystal structure to how to make doped semiconductors and the mechanics. Although the slides were written by Dr. Rack when he taught at the Rochester Institute of Technology,...

View Resource Plasma & RF Fundamentals

This is a description for a learning module from Maricopa Advanced Technology Education Center. This PDF describes the module; access may be purchased by visiting the MATEC website. One third of modern semiconductor process steps and a variety of other applications employ plasma technology. RF energy is commonly used to generate and maintain a plasma which accelerates chemical processes or...

View Resource RF Energy Simulation

In the following simulation, hosted by Maricopa Advanced Technology Education Center (MATEC), the AC power will be used to create RF plasma. RF plasma also exhibit glow regions, dark spaces, and sheaths. The objective is to explain the relationship between pressure and energy for initializing a plasma. This simulation is from Module 104 of the RF Energy and Plasma Cluster of the MATEC Module...

View Resource Materials Modification in Nanotechnology: Advanced Etch Systems

This PowerPoint created and presented by the Nanotechnology Applications and Career Knowledge (NACK) Center discusses etch systems. The presentation provides descriptions and examples of nine different system classifications, including Horizontal Plate RIE, Parallel Plate Etch, Microwave Etch, Electron Cyclotron Resonance (ECR) Etch, Hexode RIE, MERIE, Inductively Coupled Plasma (ICP) Etch, Ion...

View Resource Materials Modification in Nanotechnology: Material Fabrication Utilizing Dry Etch Chemistry

This PowerPoint created and presented by the Nanotechnology Applications and Career Knowledge (NACK) Center presents a detailed overview of all things dry etch chemistry. Its goes over key vocabulary, and introduces students to the necessary background information to understand the plasma process. Sidewall Passivation, the ?Egg? chart, microloading, etch evaluation, and identifying an end...

user login
why log in?
Manage your resources
Save, organize, and share resources that you find.

Subscribe to bulletins
Automatically be notified about new resources that match your interests.

It's easy, fast, and FREE!
for the

Copyright 2015 Internet Scout Resource Metadata
Copyright 2015 Internet Scout
NSF NSDL University of Wisconsin Internet Scout
Leave Feedback