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Title: A New Approach to Sign-Off
Url: http://www.mentor.com/products/ic_nanometer_design/techpubs/?selected...
Publisher: Mentor Graphics (Firm)
Description: This paper is available through the Mentor Graphics website. Users may request the white paper via the website, and it will be emailed to them.
Abstract: Through many years of semiconductor process evolution, the impact of manufacturing limitations and variations on layout could be encapsulated in relatively simple design rules. Design rule checking enforced these manufacturing constraints by comparing a characteristic measurement to a threshold value. Layout patterns either passed or failed these checks, with failures being fixed to ensure a DRC-clean sign-off. Then along came nanometer process technology, where increasing rates of silicon failure and longer yield ramps initiated a sea change in how designers deal with process constraints. Designers now find they can no longer adequately describe the effects of process limitations and variations using design rules alone. Most urgently, compliance with design rules no longer always guarantees acceptable yields.
LC Classification: Technology -- Electrical engineering. Electronics. Nuclear engineering -- Electrical engineering. Electronics. Nuclear engineering -- Electronics -- Apparatus and materials -- Semiconductors
Technology -- Electrical engineering. Electronics. Nuclear engineering -- Electrical engineering. Electronics. Nuclear engineering -- Electronics -- Study and teaching
Technology -- Mechanical engineering and machinery -- Control engineering systems. Automatic machinery -- Control systems -- Special, A-Z -- Semiconductors
GEM Subject: Science -- Engineering
Science -- Technology
Key Concept: Physics -- Semiconductors
Resource Type: Reading Materials
Science Materials
Format: html
Audience: College/University Instructors
Higher Education
Professional Formation
Teaching Professionals
Technical School First Cycle
Technical School Second Cycle
University First Cycle
University Postgrad
University Second Cycle
Vocational Training
Language: English
Rights: Mentor Graphics
Access Rights: Free access
Subject: Engineering Education
Date Of Record Release: 2010-06-15 03:00:01 (W3C-DTF)
Date Last Modified: 2011-08-25 16:54:23 (W3C-DTF)
Source Type: ATE Center
Source: NetWorks
Full Record Views: 68
Resource URL Clicks: 13
Cumulative Rating: NOT YET RATED
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