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Title: Assessment of Complementary Double Dipole Lithography for 45nm and 32nm Technologies
Url: http://www.mentor.com/products/ic-manufacturing/resources/overview/as...
Publisher: Mentor Graphics (Firm)
Description: This website includes the abstract of the article. Users may request the full article via the internet, which will be emailed to them. The merits of complementary double dipole illumination using 193 nm exposure wavelength with water immersion for 45 nm and 32 nm nodes is investigated. Off-axis dipole illumination shows a significant improvement in the resolution for lines and spaces oriented along the direction perpendicular to the dipole orientation. However, there is also a significant loss of resolution along the dipole direction. Consequently, two dimensional circuit patterning requires a double exposure to improve the resolution in both directions. Thus, the original layout must be decomposed into two masks: one containing the features to be primarily imaged with one dipole and another one with features to be imaged in the complementary direction. The horizontal and vertical lines must be selected and protective patches are required on each mask to protect the pattern formed by the complementary exposure. The potential capability of the dipole illumination used in conjunction with the immersion lithography for 45 nm and 32 nm nodes will be described. The Mentor Graphic approach based on the model assisted decomposition for the Double Dipole Lithography (DDL) was applied to the small clips of the 2D layout of the gate level for random logic. The lithographic process window and the CD control will be estimated through simulation. Keywords: Double Dipole Lithography, low K1 imaging, dipole illumination, lithography process window, critical dimension control, Monte-Carlo lithography simulation.
LC Classification: Social sciences -- Industries. Land use. Labor -- Industries. Land use. Labor -- Special industries and trades -- Mechanical industries -- Electronic industries -- Particular equipment, A-Z -- Integrated circuits industry
Technology -- Electrical engineering. Electronics. Nuclear engineering -- Electrical engineering. Electronics. Nuclear engineering -- Electronics -- Microelectronics. Integrated circuits
GEM Subject: Science -- Engineering
Science -- Technology
Science -- Instructional issues
Key Concept: Physics -- Circuits
Physics -- Waves
Manufacturing -- Integrated circuits
Key Concepts Complete: Yes
Resource Type: Instructional Materials
Reading Materials
Science Materials
Format: html
Audience: College/University Instructors
Higher Education
Professional Formation
Teaching Professionals
Technical School First Cycle
Technical School Second Cycle
University First Cycle
University Postgrad
University Second Cycle
Vocational Training
Language: English
Rights: Mentor Graphics
Access Rights: Free access
Subject: Electrical Engineering
Engineering Education
Date Of Record Release: 2012-07-13 11:07:37 (W3C-DTF)
Date Last Modified: 2012-11-05 12:23:20 (W3C-DTF)
Source Type: ATE Center
Source: NetWorks
Full Record Views: 44
Resource URL Clicks: 6
Cumulative Rating: NOT YET RATED
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