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Title: 193nm Immersion Lithography: Status and Challenges
Url: http://spie.org/x8368.xml
Creator: Back, David
Wei, Yayi
Publisher: Society of Photographic Instrumentation Engineers
Description: This article is a comprehensive review of 193nm immersion lithography. It focuses on the materials and processes rather than the optical system of the tool. The article covers the history and current status of the technology.
LC Classification: Bibliography. Library science. Information resources (General) -- Book industries and trade -- Printing -- Practical printing -- Other processes, A-Z -- Lithography
Science -- Physics -- Optics. Light
GEM Subject: Science -- Engineering
Science -- Technology
Science -- Physics
Key Concept: Physics
Physics -- Waves
Key Concepts Complete: Yes
Date Issued: 2007-03-22
Resource Type: Instructional Materials
Reading Materials
Science Materials
Format: html
Audience: College/University Instructors
Professional Formation
Technical School First Cycle
Technical School Second Cycle
University First Cycle
University Postgrad
University Second Cycle
Vocational Training
Language: English
Rights: SPIE
Access Rights: Free access
Subject: Engineering Education
Industrial and Systems Engineering -- Manufacturing Processes and Systems
Materials Science and Engineering
Semiconductor
Date Of Record Release: 2010-12-23 03:00:02 (W3C-DTF)
Date Last Modified: 2011-08-26 11:18:52 (W3C-DTF)
Source Type: ATE Center
Source: NetWorks
Full Record Views: 133
Resource URL Clicks: 23
Cumulative Rating: NOT YET RATED
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