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Title: Materials Modification in Nanotechnology: Advanced Etch Systems
Url: http://nano4me.live.subhub.com/downloads/20091120_4
Publisher: National Center for Nanotechnology Applications and Career Knowledge
Pennsylvania State University
Description: This PowerPoint created and presented by the Nanotechnology Applications and Career Knowledge (NACK) Center discusses etch systems. The presentation provides descriptions and examples of nine different system classifications, including Horizontal Plate RIE, Parallel Plate Etch, Microwave Etch, Electron Cyclotron Resonance (ECR) Etch, Hexode RIE, MERIE, Inductively Coupled Plasma (ICP) Etch, Ion Beam Etch, and Advanced Strip and Passivation (ASP). This presentation also has a cluster tools section, explaining their function and configuration. This is a great resource for any classroom looking at nanofabrication modifications. This and all other valuable resources from the NACK Center require a fast, easy, free log-in.
LC Classification: Technology -- Chemical technology -- Chemical engineering -- Special processes and operations, A-Z -- Etching
Technology -- Engineering (General). Civil engineering -- Engineering (General). Civil engineering (General) -- Materials of engineering and construction -- Materials of special composition or structure, A-Z -- Nanostructured materials
Technology -- Engineering (General). Civil engineering -- Engineering (General). Civil engineering (General) -- Plasma engineering. Applied plasma dynamics
Technology -- Technology (General) -- Nanotechnology
GEM Subject: Science -- Engineering
Science -- Technology
Vocational Education -- Technology
Vocational Education -- Trade and industrial
Key Concept: Manufacturing -- Nanofabrication
Date Issued: 2009
Resource Type: Instructional Materials
Reading Materials
Science Materials
Format: html
Audience: College/University Instructors
Higher Education
Technical School First Cycle
Technical School Second Cycle
University First Cycle
Vocational Training
Language: English
Rights: Pennsylvania State University
Access Rights: Free access
Source Type: ATE Center
Source: National Center for Nanotechnology Applications and Career Knowledge
Full Record Views: 8
Cumulative Rating: NOT YET RATED
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