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Assessment of Complementary Double Dipole Lithography for 45nm and 32nm Technologies
This website includes the abstract of the article. Users may request the full article via the internet, which will be emailed to them. The merits of complementary double dipole illumination using 193 nm exposure...
A New Approach to Sign-Off
This paper is available through the Mentor Graphics website. Users may request the white paper via the website, and it will be emailed to them. Abstract: Through many years of semiconductor process evolution, the...
Spaces for Learning: A Review of Learning Spaces in Further and Higher Education
This report of The Scottish Funding Council is to encourage discussion of the best form of campus development, in light of emerging learning trends relevant to their institutions. Teaching-centered models are being...
Cultivating Careers: Professional Development for Campus IT
Cultivating Careers: Professional Development for Campus IT provides an overview of current principles and practices for mentoring and developing IT professionals in higher education. Edited by EDUCAUSE Vice President...
Wade Adams Key Note Presentation: Nanotechnology
This is a presentation by Wade Adams. This was his keynote address at the 2007 Arizona Nanotechnology Symposium on March 23 at Scottsdale Community College. With oil production reserves being a finite quantity in the...
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