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Maricopa Advanced Technology Education Center (MATEC)
11 - 15
Workflow in the Planarization Tool
Animation of the workflow in the planarization tool. The objective is to describe the workflow of a planarization workstation.This simulation is from Module 069 of the Process & Equipment III Cluster of the MATEC...
Chemical Mechanical Planarization Simulation
In the simulation you will use controls (drop down menus) to adjust down force and platen speed parameters to determine an optimum CMP process recipe for focal semiconductor manufacturing. You may assume that focal is...
Ion Implant Pinball Game
The magnetic force of the ions can be compared to a pinball machine with three different masses. If the same impulse is applied to each ball, only the one with the ideal mass will "hit" the target. The objective is to...
Chemical Mechanical Planarization - Multilayer planarization
There are many different ways in which the dual damascene process is used. The animation shows an overview of one process: -In the dual damascene process, a low-k dielectric is added. -CMP is used to remove dielectric...
eSyst: Electronics 2010 Update 5 slides
These are the slides for the NetWorks Webinar that was held on 1/23/2009 for eSyst: Electronics 2010 update 5. If you are an Electronics Faculty, or Chair of an Electronics department, this is a webinar not to miss....
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